Issued Patents 2017
Showing 1–4 of 4 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9752251 | Self-limiting selective epitaxy process for preventing merger of semiconductor fins | Kevin K. Chan, Yue Ke, Annie Levesque | 2017-09-05 |
| 9577099 | Diamond shaped source drain epitaxy with underlying buffer layer | Veeraraghavan S. Basker, Yue Ke, Alexander Reznicek, Henry K. Utomo | 2017-02-21 |
| 9577100 | FinFET and nanowire semiconductor devices with suspended channel regions and gate structures surrounding the suspended channel regions | Kangguo Cheng, Michael P. Chudzik, Judson R. Holt, Yue Ke, Rishikesh Krishnan +2 more | 2017-02-21 |
| 9536985 | Epitaxial growth of material on source/drain regions of FinFET structure | Michael P. Chudzik, Brian J. Greene, Judson R. Holt, Yue Ke, Rishikesh Krishnan +2 more | 2017-01-03 |