EJ

Eric A. Joseph

IBM: 13 patents #293 of 10,852Top 3%
ZE Zeon: 2 patents #13 of 119Top 15%
TL Tokyo Electron Limited: 1 patents #266 of 744Top 40%
Overall (2017): #4,230 of 506,227Top 1%
13
Patents 2017

Issued Patents 2017

Patent #TitleCo-InventorsDate
9799552 Low resistance metal contacts to interconnects Stephen M. Gates, Gregory M. Fritz, Terry A. Spooner 2017-10-24
9799519 Selective sputtering with light mass ions to sharpen sidewall of subtractively patterned conductive metal layer Hiroyuki Miyazoe 2017-10-24
9786597 Self-aligned pitch split for unidirectional metal wiring Josephine B. Chang, Michael A. Guillorn, Hiroyuki Miyazoe 2017-10-10
9786550 Low resistance metal contacts to interconnects Stephen M. Gates, Gregory M. Fritz, Terry A. Spooner 2017-10-10
9728421 High aspect ratio patterning of hard mask materials by organic soft masks Markus Brink, Sebastian U. Engelmann, Hiroyuki Miyazoe 2017-08-08
9711365 Etch rate enhancement for a silicon etch process through etch chamber pretreatment Goh Matsuura, Masahiro Nakamura, Edmund M. Sikorski, Bang N. To 2017-07-18
9705077 Spin torque MRAM fabrication using negative tone lithography and ion beam etching Anthony J. Annunziata, Armand A. Galan, Steve Holmes, Gen P. Lauer, Qinghuang Lin +1 more 2017-07-11
9691972 Low temperature encapsulation for magnetic tunnel junction Anthony J. Annunziata, Sebastian U. Engelmann, Gen P. Lauer, Nathan P. Marchack, Deborah A. Neumayer +1 more 2017-06-27
9653395 Hybrid subtractive etch/metal fill process for fabricating interconnects Robert L. Bruce, Gregory M. Fritz, Hiroyuki Miyazoe 2017-05-16
9646881 Hybrid subtractive etch/metal fill process for fabricating interconnects Robert L. Bruce, Gregory M. Fritz, Hiroyuki Miyazoe 2017-05-09
9583401 Nano deposition and ablation for the repair and fabrication of integrated circuits Shawn A. Adderly, Jeffrey P. Gambino, Anthony C. Speranza 2017-02-28
9564362 Interconnects based on subtractive etching of silver Brett C. Baker-O'Neal, Hiroyuki Miyazoe 2017-02-07
9536731 Wet clean process for removing CxHyFz etch residue Robert L. Bruce, Sebastian U. Engelmann, Mahmoud Khojasteh, Masahiro Nakamura, Satyavolu S. Papa Rao +3 more 2017-01-03