Issued Patents 2017
Showing 1–13 of 13 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9799552 | Low resistance metal contacts to interconnects | Stephen M. Gates, Gregory M. Fritz, Terry A. Spooner | 2017-10-24 |
| 9799519 | Selective sputtering with light mass ions to sharpen sidewall of subtractively patterned conductive metal layer | Hiroyuki Miyazoe | 2017-10-24 |
| 9786597 | Self-aligned pitch split for unidirectional metal wiring | Josephine B. Chang, Michael A. Guillorn, Hiroyuki Miyazoe | 2017-10-10 |
| 9786550 | Low resistance metal contacts to interconnects | Stephen M. Gates, Gregory M. Fritz, Terry A. Spooner | 2017-10-10 |
| 9728421 | High aspect ratio patterning of hard mask materials by organic soft masks | Markus Brink, Sebastian U. Engelmann, Hiroyuki Miyazoe | 2017-08-08 |
| 9711365 | Etch rate enhancement for a silicon etch process through etch chamber pretreatment | Goh Matsuura, Masahiro Nakamura, Edmund M. Sikorski, Bang N. To | 2017-07-18 |
| 9705077 | Spin torque MRAM fabrication using negative tone lithography and ion beam etching | Anthony J. Annunziata, Armand A. Galan, Steve Holmes, Gen P. Lauer, Qinghuang Lin +1 more | 2017-07-11 |
| 9691972 | Low temperature encapsulation for magnetic tunnel junction | Anthony J. Annunziata, Sebastian U. Engelmann, Gen P. Lauer, Nathan P. Marchack, Deborah A. Neumayer +1 more | 2017-06-27 |
| 9653395 | Hybrid subtractive etch/metal fill process for fabricating interconnects | Robert L. Bruce, Gregory M. Fritz, Hiroyuki Miyazoe | 2017-05-16 |
| 9646881 | Hybrid subtractive etch/metal fill process for fabricating interconnects | Robert L. Bruce, Gregory M. Fritz, Hiroyuki Miyazoe | 2017-05-09 |
| 9583401 | Nano deposition and ablation for the repair and fabrication of integrated circuits | Shawn A. Adderly, Jeffrey P. Gambino, Anthony C. Speranza | 2017-02-28 |
| 9564362 | Interconnects based on subtractive etching of silver | Brett C. Baker-O'Neal, Hiroyuki Miyazoe | 2017-02-07 |
| 9536731 | Wet clean process for removing CxHyFz etch residue | Robert L. Bruce, Sebastian U. Engelmann, Mahmoud Khojasteh, Masahiro Nakamura, Satyavolu S. Papa Rao +3 more | 2017-01-03 |