Issued Patents 2017
Showing 1–6 of 6 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9711365 | Etch rate enhancement for a silicon etch process through etch chamber pretreatment | Eric A. Joseph, Goh Matsuura, Edmund M. Sikorski, Bang N. To | 2017-07-18 |
| 9633948 | Low energy etch process for nitrogen-containing dielectric layer | Markus Brink, Robert L. Bruce, Sebastian U. Engelmann, Nicholas C. M. Fuller, Hiroyuki Miyazoe | 2017-04-25 |
| 9627533 | High selectivity nitride removal process based on selective polymer deposition | Ravi K. Dasaka, Sebastian U. Engelmann, Nicholas C. M. Fuller, Richard S. Wise | 2017-04-18 |
| 9593272 | Silica for CMP, aqueous dispersion, and process for producing silica for CMP | Ryuji Ishimoto | 2017-03-14 |
| 9589222 | Non-transitory storage medium encoded with computer readable information processing program, information processing apparatus, information processing system, and information processing method | Keiichiro Yoshida | 2017-03-07 |
| 9536731 | Wet clean process for removing CxHyFz etch residue | Robert L. Bruce, Sebastian U. Engelmann, Eric A. Joseph, Mahmoud Khojasteh, Satyavolu S. Papa Rao +3 more | 2017-01-03 |