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Carbon nanostructure device fabrication utilizing protect layers |
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Shallow trench isolation for semiconductor devices |
Kevin K. Chan, Stephan A. Cohen, Deborah A. Neumayer |
2017-07-04 |
| 9691705 |
Ultrathin superlattice of MnO/Mn/MnN and other metal oxide/metal/metal nitride liners and caps for copper low dielectric constant interconnects |
Donald F. Canaperi, Daniel C. Edelstein, Son V. Nguyen, Takeshi Nogami, Deepika Priyadarshini +1 more |
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Hydrogen-free silicon-based deposited dielectric films for nano device fabrication |
Donald F. Canaperi, Sanjay C. Mehta, Son V. Nguyen, Deepika Priyadarshini, Hosadurga Shobha +1 more |
2017-03-28 |
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Low temperature spacer for advanced semiconductor devices |
Kevin K. Chan, Deborah A. Neumayer, Dae-Gyu Park, Norma E. Sosa, Min Yang |
2017-03-07 |
| 9558935 |
Hydrogen-free silicon-based deposited dielectric films for nano device fabrication |
Donald F. Canaperi, Sanjay C. Mehta, Son V. Nguyen, Deepika Priyadarshini, Hosadurga Shobha +1 more |
2017-01-31 |
| 9558934 |
Hydrogen-free silicon-based deposited dielectric films for nano device fabrication |
Donald F. Canaperi, Sanjay C. Mehta, Son V. Nguyen, Deepika Priyadarshini, Hosadurga Shobha +1 more |
2017-01-31 |
| 9536733 |
Hydrogen-free silicon-based deposited dielectric films for nano device fabrication |
Donald F. Canaperi, Sanjay C. Mehta, Son V. Nguyen, Deepika Priyadarshini, Hosadurga Shobha +1 more |
2017-01-03 |
