Issued Patents 2017
Showing 1–8 of 8 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9852889 | Systems and methods for controlling directionality of ions in an edge region by using an electrode within a coupling ring | Michael C. Kellogg, John Holland, Zhigang Chen, Felix Kozakevich, Kenneth Lucchesi | 2017-12-26 |
| 9793126 | Ion to neutral control for wafer processing with dual plasma source reactor | Rajinder Dhindsa, Sang Ki Nam, Eric A. Hudson | 2017-10-17 |
| 9793128 | Plasma processing chamber with dual axial gas injection and exhaust | Rajinder Dhindsa, Andrew D. Bailey, III | 2017-10-17 |
| 9761414 | Uniformity control circuit for use within an impedance matching circuit | Felix Kozakevich, Kenneth Lucchesi, John Holland | 2017-09-12 |
| 9620334 | Control of etch rate using modeling, feedback and impedance match | Bradford J. Lyndaker, John C. Valcore, Jr., Seyed Jafar Jafarian-Tehrani, Zhigang Chen | 2017-04-11 |
| 9595424 | Impedance matching circuit for operation with a kilohertz RF generator and a megahertz RF generator to control plasma processes | Felix Kozakevich, John Holland, Brett Jacobs | 2017-03-14 |
| 9536711 | Method and apparatus for DC voltage control on RF-powered electrode | Rajinder Dhindsa, Eric A. Hudson, Maryam Moravej, Andreas Fischer | 2017-01-03 |
| 9536749 | Ion energy control by RF pulse shape | Zhigang Chen, John Holland | 2017-01-03 |