Issued Patents 2016
Showing 1–12 of 12 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9494864 | Resist overlayer film forming composition for lithography and method for manufacturing semiconductor device using the same | Ryuji Ohnishi, Bangching Ho | 2016-11-15 |
| 9469777 | Resist underlayer film forming composition that contains novolac resin having polynuclear phenol | Takafumi Endo, Tetsuya Shinjo, Keisuke Hashimoto, Yasunobu Someya, Hirokazu Nishimaki +1 more | 2016-10-18 |
| 9448480 | Resist underlayer film formation composition and method for forming resist pattern using the same | Tokio NISHITA, Ryuji Ohnishi, Noriaki Fujitani | 2016-09-20 |
| 9394231 | Composition for forming antistatic film and oligomer compound | Tokio NISHITA, Ryuta MIZUOCHI, Tomohisa Yamada, Naoki Nakaie, Yuki TAKAYAMA | 2016-07-19 |
| 9395628 | Resist underlayer film-forming composition containing aryl sulfonate salt having hydroxyl group | Takafumi Endo, Keisuke Hashimoto, Hirokazu Nishimaki | 2016-07-19 |
| 9384977 | Method of manufacturing semiconductor device using organic underlayer film forming composition for solvent development lithography process | Yasunobu Someya, Satoshi Takeda, Keisuke Hashimoto, Tetsuya Shinjo | 2016-07-05 |
| 9337052 | Silicon-containing EUV resist underlayer film forming composition | Shuhei Shigaki, Hiroaki Yaguchi, Bang-Ching Ho | 2016-05-10 |
| 9263286 | Diarylamine novolac resin | Yasunobu Someya, Keisuke Hashimoto, Hirokazu Nishimaki | 2016-02-16 |
| 9261790 | Resist underlayer film-forming composition containing copolymer resin having heterocyclic ring | Yasunobu Someya, Keisuke Hashimoto, Tetsuya Shinjo, Hirokazu Nishimaki, Ryo Karasawa | 2016-02-16 |
| 9250525 | Resist underlayer film-forming composition | Takafumi Endo, Noriaki Fujitani | 2016-02-02 |
| 9244353 | Resist underlayer film forming composition | Hirokazu Nishimaki, Keisuke Hashimoto, Tetsuya Shinjo, Takafumi Endo | 2016-01-26 |
| 9240327 | Resist underlayer film-forming composition for EUV lithography containing condensation polymer | Noriaki Fujitani, Takafumi Endo, Ryuji Ohnishi, Bangching Ho | 2016-01-19 |