Issued Patents 2016
Showing 1–4 of 4 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9448480 | Resist underlayer film formation composition and method for forming resist pattern using the same | Tokio NISHITA, Ryuji Ohnishi, Rikimaru Sakamoto | 2016-09-20 |
| 9436085 | Composition for forming photosensitive resist underlayer film | Yusuke Horiguchi, Makiko Umezaki, Hirokazu Nishimaki, Takahiro Kishioka, Takahiro Hamada | 2016-09-06 |
| 9250525 | Resist underlayer film-forming composition | Takafumi Endo, Rikimaru Sakamoto | 2016-02-02 |
| 9240327 | Resist underlayer film-forming composition for EUV lithography containing condensation polymer | Rikimaru Sakamoto, Takafumi Endo, Ryuji Ohnishi, Bangching Ho | 2016-01-19 |