Issued Patents 2016
Showing 1–7 of 7 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9514949 | Composition for forming organic hard mask layer for use in lithography containing polymer having acrylamide structure | Yuki Usui, Masakazu Kato, Tetsuya Shinjo, Keisuke Hashimoto, Ryo Karasawa | 2016-12-06 |
| 9469777 | Resist underlayer film forming composition that contains novolac resin having polynuclear phenol | Takafumi Endo, Tetsuya Shinjo, Keisuke Hashimoto, Hirokazu Nishimaki, Ryo Karasawa +1 more | 2016-10-18 |
| 9384977 | Method of manufacturing semiconductor device using organic underlayer film forming composition for solvent development lithography process | Satoshi Takeda, Keisuke Hashimoto, Tetsuya Shinjo, Rikimaru Sakamoto | 2016-07-05 |
| 9343324 | Resist underlayer film-forming composition which contains alicyclic skeleton-containing carbazole resin | Tetsuya Shinjo, Keisuke Hashimoto, Ryo Karasawa | 2016-05-17 |
| 9261790 | Resist underlayer film-forming composition containing copolymer resin having heterocyclic ring | Keisuke Hashimoto, Tetsuya Shinjo, Hirokazu Nishimaki, Ryo Karasawa, Rikimaru Sakamoto | 2016-02-16 |
| 9263286 | Diarylamine novolac resin | Rikimaru Sakamoto, Keisuke Hashimoto, Hirokazu Nishimaki | 2016-02-16 |
| 9263285 | Composition for forming a resist underlayer film including hydroxyl group-containing carbazole novolac resin | Tetsuya Shinjo, Hiroaki Okuyama, Keisuke Hashimoto, Ryo Karasawa, Masakazu Kato | 2016-02-16 |