Issued Patents 2016
Showing 1–7 of 7 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9514949 | Composition for forming organic hard mask layer for use in lithography containing polymer having acrylamide structure | Yasunobu Someya, Yuki Usui, Masakazu Kato, Keisuke Hashimoto, Ryo Karasawa | 2016-12-06 |
| 9469777 | Resist underlayer film forming composition that contains novolac resin having polynuclear phenol | Takafumi Endo, Keisuke Hashimoto, Yasunobu Someya, Hirokazu Nishimaki, Ryo Karasawa +1 more | 2016-10-18 |
| 9384977 | Method of manufacturing semiconductor device using organic underlayer film forming composition for solvent development lithography process | Yasunobu Someya, Satoshi Takeda, Keisuke Hashimoto, Rikimaru Sakamoto | 2016-07-05 |
| 9343324 | Resist underlayer film-forming composition which contains alicyclic skeleton-containing carbazole resin | Yasunobu Someya, Keisuke Hashimoto, Ryo Karasawa | 2016-05-17 |
| 9263285 | Composition for forming a resist underlayer film including hydroxyl group-containing carbazole novolac resin | Hiroaki Okuyama, Keisuke Hashimoto, Yasunobu Someya, Ryo Karasawa, Masakazu Kato | 2016-02-16 |
| 9261790 | Resist underlayer film-forming composition containing copolymer resin having heterocyclic ring | Yasunobu Someya, Keisuke Hashimoto, Hirokazu Nishimaki, Ryo Karasawa, Rikimaru Sakamoto | 2016-02-16 |
| 9244353 | Resist underlayer film forming composition | Hirokazu Nishimaki, Keisuke Hashimoto, Takafumi Endo, Rikimaru Sakamoto | 2016-01-26 |