Issued Patents 2016
Showing 1–11 of 11 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9514949 | Composition for forming organic hard mask layer for use in lithography containing polymer having acrylamide structure | Yasunobu Someya, Yuki Usui, Masakazu Kato, Tetsuya Shinjo, Ryo Karasawa | 2016-12-06 |
| 9477133 | Displaying medium and displaying apparatus | Kazuhiko Ueda, Ken Kikuchi | 2016-10-25 |
| 9469777 | Resist underlayer film forming composition that contains novolac resin having polynuclear phenol | Takafumi Endo, Tetsuya Shinjo, Yasunobu Someya, Hirokazu Nishimaki, Ryo Karasawa +1 more | 2016-10-18 |
| 9395628 | Resist underlayer film-forming composition containing aryl sulfonate salt having hydroxyl group | Takafumi Endo, Hirokazu Nishimaki, Rikimaru Sakamoto | 2016-07-19 |
| 9391277 | Device comprising positive hole injection transport layer, method for producing the same and ink for forming positive hole injection transport layer | Shigehiro Ueno, Masato Okada, Shinsuke Nagino | 2016-07-12 |
| 9384977 | Method of manufacturing semiconductor device using organic underlayer film forming composition for solvent development lithography process | Yasunobu Someya, Satoshi Takeda, Tetsuya Shinjo, Rikimaru Sakamoto | 2016-07-05 |
| 9343324 | Resist underlayer film-forming composition which contains alicyclic skeleton-containing carbazole resin | Tetsuya Shinjo, Yasunobu Someya, Ryo Karasawa | 2016-05-17 |
| 9263286 | Diarylamine novolac resin | Rikimaru Sakamoto, Yasunobu Someya, Hirokazu Nishimaki | 2016-02-16 |
| 9263285 | Composition for forming a resist underlayer film including hydroxyl group-containing carbazole novolac resin | Tetsuya Shinjo, Hiroaki Okuyama, Yasunobu Someya, Ryo Karasawa, Masakazu Kato | 2016-02-16 |
| 9261790 | Resist underlayer film-forming composition containing copolymer resin having heterocyclic ring | Yasunobu Someya, Tetsuya Shinjo, Hirokazu Nishimaki, Ryo Karasawa, Rikimaru Sakamoto | 2016-02-16 |
| 9244353 | Resist underlayer film forming composition | Hirokazu Nishimaki, Tetsuya Shinjo, Takafumi Endo, Rikimaru Sakamoto | 2016-01-26 |