| 9441298 |
Devices including metal-silicon contacts using indium arsenide films and apparatus and methods |
Khaled Ahmed, Prabu Gopalraja, Atif Noori |
2016-09-13 |
| 9353440 |
Dual-direction chemical delivery system for ALD/CVD chambers |
Zhenbin Ge, Chien-Teh Kao, Joel M. Huston |
2016-05-31 |
| 9305805 |
Methods for atomic layer etching |
Joseph Yudovsky |
2016-04-05 |
| 9269584 |
N-metal film deposition with initiation layer |
Seshadri Ganguli, Xinliang Lu, Atif Noori, Maitreyee Mahajani, Shih Chung Chen |
2016-02-23 |
| 9252024 |
Deposition chambers with UV treatment and methods of use |
Hyman Lam, Nicholas R. Denny, Joseph AuBuchon |
2016-02-02 |
| 9230815 |
Methods for depositing fluorine/carbon-free conformal tungsten |
Xinyu Fu, Srinivas Gandikota, Avgerinos V. Gelatos, Atif Noori, David Thompson +1 more |
2016-01-05 |
