Issued Patents 2016
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9418890 | Method for tuning a deposition rate during an atomic layer deposition process | Paul F. Ma, Jiang Lu, Mei Chang | 2016-08-16 |
| 9252024 | Deposition chambers with UV treatment and methods of use | Hyman Lam, Nicholas R. Denny, Mei Chang | 2016-02-02 |