Issued Patents 2016
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9460932 | Surface poisoning using ALD for high selectivity deposition of high aspect ratio features | Paul F. Ma, Guodan Wei | 2016-10-04 |
| 9418890 | Method for tuning a deposition rate during an atomic layer deposition process | Paul F. Ma, Joseph AuBuchon, Mei Chang | 2016-08-16 |