| 9441298 |
Devices including metal-silicon contacts using indium arsenide films and apparatus and methods |
Khaled Ahmed, Prabu Gopalraja, Mei Chang |
2016-09-13 |
| 9443728 |
Accelerated relaxation of strain-relaxed epitaxial buffers by use of integrated or stand-alone thermal processing |
Swaminathan Srinivasan, David K. Carlson |
2016-09-13 |
| 9305780 |
Self-limiting chemical vapor deposition and atomic layer deposition methods |
Mary Edmonds, Andrew C. Kummel |
2016-04-05 |
| 9269574 |
Methods of fabricating dielectric films from metal amidinate precursors |
Steven C. H. Hung, David Thompson, Yoshihide Senzaki |
2016-02-23 |
| 9269584 |
N-metal film deposition with initiation layer |
Seshadri Ganguli, Xinliang Lu, Maitreyee Mahajani, Shih Chung Chen, Mei Chang |
2016-02-23 |
| 9230815 |
Methods for depositing fluorine/carbon-free conformal tungsten |
Xinyu Fu, Srinivas Gandikota, Avgerinos V. Gelatos, Mei Chang, David Thompson +1 more |
2016-01-05 |