| 9490197 |
Three dimensional organic or glass interposer |
Mukta G. Farooq, William Francis Landers, Andrew J. Martin, Kathryn E. Schlichting, Melissa A. Smith |
2016-11-08 |
| 9472465 |
Methods of fabricating integrated circuits |
Bongki Lee, Bharat Krishnan |
2016-10-18 |
| 9466723 |
Liner and cap layer for placeholder source/drain contact structure planarization and replacement |
Haigou Huang, Qiang Fang, Huang Liu |
2016-10-11 |
| 9455201 |
Integration method for fabrication of metal gate based multiple threshold voltage devices and circuits |
Manoj Joshi, Manfred Eller, Rohit Pal, Richard J. Carter, Srikanth B. Samavedam +1 more |
2016-09-27 |
| 9443956 |
Method for forming air gap structure using carbon-containing spacer |
Hong Yu, Biao Zuo, Huang Liu |
2016-09-13 |
| 9419126 |
Integrated circuits and methods for fabricating integrated circuits with active area protection |
Xiaodong Yang, Yanxiang Liu, Xusheng Wu |
2016-08-16 |
| 9406676 |
Method for forming single diffusion breaks between finFET devices and the resulting devices |
Hong Yu, Hongliang Shen, Zhenyu Hu |
2016-08-02 |
| 9401416 |
Method for reducing gate height variation due to overlapping masks |
Hong Yu, Haigou Huang, Huang Liu |
2016-07-26 |
| 9373535 |
T-shaped fin isolation region and methods of fabrication |
Hongliang Shen, Zhenyu Hu |
2016-06-21 |
| 9366865 |
Wearable electronic device with integrated antenna |
Liefeng Jin, Jinqiang Lin |
2016-06-14 |
| 9368342 |
Defect-free relaxed covering layer on semiconductor substrate with lattice mismatch |
Haigou Huang, Huang Liu |
2016-06-14 |
| 9362180 |
Integrated circuit having multiple threshold voltages |
Bongki Lee, Manoj Joshi, Manfred Eller, Rohit Pal, Richard J. Carter +1 more |
2016-06-07 |
| 9343371 |
Fabricating fin structures with doped middle portions |
Xusheng Wu |
2016-05-17 |
| 9312145 |
Conformal nitridation of one or more fin-type transistor layers |
Wei Tong, Tien Ying Luo, Yan Ping SHEN, Feng Zhou, Jun Lian +4 more |
2016-04-12 |
| 9293382 |
Voltage contrast inspection of deep trench isolation |
Norbert Arnold, Brian W. Messenger, Oliver D. Patterson |
2016-03-22 |
| 9263520 |
Facilitating fabricating gate-all-around nanowire field-effect transistors |
Jing Wan, Andy Wei |
2016-02-16 |
| 9236481 |
Semiconductor device and methods of forming fins and gates with ultraviolet curing |
Hui Zang |
2016-01-12 |
| 9230822 |
Uniform gate height for mixed-type non-planar semiconductor devices |
Hong Yu, Haigou Huang, Huang Liu |
2016-01-05 |
