Issued Patents 2016
Showing 1–7 of 7 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9455198 | Methods of removing fins so as to form isolation structures on products that include FinFET semiconductor devices | Hong Yu, Zhenyu Hu, Lun Zhao, Richard J. Carter, Xusheng Wu | 2016-09-27 |
| 9406676 | Method for forming single diffusion breaks between finFET devices and the resulting devices | Hong Yu, Zhenyu Hu, Jin Ping Liu | 2016-08-02 |
| 9385192 | Shallow trench isolation integration methods and devices formed thereby | Kyutae Na, Sandeep Gaan, Hsin-Neng Tai, Weihua Tong, Sang Cheol Han +6 more | 2016-07-05 |
| 9373535 | T-shaped fin isolation region and methods of fabrication | Zhenyu Hu, Jin Ping Liu | 2016-06-21 |
| 9368496 | Method for uniform recess depth and fill in single diffusion break for fin-type process and resulting devices | Hong Yu | 2016-06-14 |
| 9362176 | Uniform exposed raised structures for non-planar semiconductor devices | Hong Yu, Zhao Lun, Zhenyu Hu, Richard J. Carter | 2016-06-07 |
| 9263516 | Product comprised of FinFET devices with single diffusion break isolation structures | Xusheng Wu, Changyong Xiao, Wanxun He | 2016-02-16 |