Issued Patents 2016
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9455198 | Methods of removing fins so as to form isolation structures on products that include FinFET semiconductor devices | Hong Yu, Hongliang Shen, Zhenyu Hu, Richard J. Carter, Xusheng Wu | 2016-09-27 |
| 9324713 | Eliminating field oxide loss prior to FinFET source/drain epitaxial growth | Hong Yu, Bingwu Liu, Hui Zang | 2016-04-26 |