Issued Patents 2016
Showing 1–7 of 7 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9523913 | Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, method for manufacturing electronic device, and electronic device | Keita Kato, Hidenori Takahashi, Shoichi SAITOH, Fumihiro YOSHINO | 2016-12-20 |
| 9523912 | Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, manufacturing method of electronic device, electronic device and compound | Shohei Kataoka, Akinori Shibuya, Toshiaki Fukuhara, Hajime Furutani | 2016-12-20 |
| 9482947 | Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, manufacturing method of electronic device and electronic device | Shuhei Yamaguchi, Hidenori Takahashi, Shohei Kataoka, Shoichi SAITOH, Fumihiro YOSHINO | 2016-11-01 |
| 9423689 | Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, manufacturing method of electronic device and electronic device | Shuhei Yamaguchi, Hidenori Takahashi, Fumihiro YOSHINO | 2016-08-23 |
| 9417528 | Pattern forming method, multi-layered resist pattern, multi-layered film for organic solvent development, resist composition, method for manufacturing electronic device, and electronic device | Keita Kato, Tadahiro ODANI, Atsushi Nakamura, Hidenori Takahashi, Kaoru Iwato | 2016-08-16 |
| 9316910 | Pattern forming method, actinic-ray-sensitive or radiation-sensitive resin composition, and resist film | Shohei Kataoka, Hidenori Takahashi, Shuhei Yamaguchi, Shoichi SAITOH, Fumihiro YOSHINO | 2016-04-19 |
| 9250532 | Pattern forming method, multi-layered resist pattern, multi-layered film for organic solvent development, resist composition, method for manufacturing electronic device, and electronic device | Keita Kato, Tadahiro ODANI, Atsushi Nakamura, Hidenori Takahashi, Kaoru Iwato | 2016-02-02 |