Issued Patents 2016
Showing 1–5 of 5 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9523913 | Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, method for manufacturing electronic device, and electronic device | Michihiro SHIRAKAWA, Hidenori Takahashi, Shoichi SAITOH, Fumihiro YOSHINO | 2016-12-20 |
| 9513547 | Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, method for manufacturing electronic device, and electronic device | Sou Kamimura, Hidenori Takahashi | 2016-12-06 |
| 9482958 | Method of forming pattern and developer for use in the method | Yuichiro Enomoto, Shinji Tarutani, Sou Kamimura, Kaoru Iwato, Kana Fujii | 2016-11-01 |
| 9417528 | Pattern forming method, multi-layered resist pattern, multi-layered film for organic solvent development, resist composition, method for manufacturing electronic device, and electronic device | Michihiro SHIRAKAWA, Tadahiro ODANI, Atsushi Nakamura, Hidenori Takahashi, Kaoru Iwato | 2016-08-16 |
| 9250532 | Pattern forming method, multi-layered resist pattern, multi-layered film for organic solvent development, resist composition, method for manufacturing electronic device, and electronic device | Michihiro SHIRAKAWA, Tadahiro ODANI, Atsushi Nakamura, Hidenori Takahashi, Kaoru Iwato | 2016-02-02 |