Issued Patents 2016
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9513547 | Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, method for manufacturing electronic device, and electronic device | Hidenori Takahashi, Keita Kato | 2016-12-06 |
| 9482958 | Method of forming pattern and developer for use in the method | Yuichiro Enomoto, Shinji Tarutani, Kaoru Iwato, Keita Kato, Kana Fujii | 2016-11-01 |