HT

Hidenori Takahashi

FU Fujifilm: 11 patents #8 of 767Top 2%
FC Fuji Electric Co.: 2 patents #55 of 295Top 20%
Fujitsu Limited: 1 patents #735 of 1,896Top 40%
NI Nipro: 1 patents #20 of 42Top 50%
TO Toyota: 1 patents #915 of 2,945Top 35%
Overall (2016): #2,451 of 481,213Top 1%
16
Patents 2016

Issued Patents 2016

Showing 1–16 of 16 patents

Patent #TitleCo-InventorsDate
9523913 Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, method for manufacturing electronic device, and electronic device Keita Kato, Michihiro SHIRAKAWA, Shoichi SAITOH, Fumihiro YOSHINO 2016-12-20
9513547 Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, method for manufacturing electronic device, and electronic device Sou Kamimura, Keita Kato 2016-12-06
9496370 Manufacturing method of semiconductor apparatus and semiconductor apparatus Yasushi Niimura, Sota WATANABE, Takumi Fujimoto, Takeyoshi Nishimura, Takamasa Wakabayashi 2016-11-15
9482947 Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, manufacturing method of electronic device and electronic device Shuhei Yamaguchi, Michihiro SHIRAKAWA, Shohei Kataoka, Shoichi SAITOH, Fumihiro YOSHINO 2016-11-01
9463275 Infusion pump Mitsutaka Ueda, Ryoichi Akai 2016-10-11
9423689 Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, manufacturing method of electronic device and electronic device Shuhei Yamaguchi, Michihiro SHIRAKAWA, Fumihiro YOSHINO 2016-08-23
9417523 Pattern forming method, actinic ray-sensitive or radiation-sensitive composition used therein, resist film, manufacturing method of electronic device using the same, and electronic device 2016-08-16
9417528 Pattern forming method, multi-layered resist pattern, multi-layered film for organic solvent development, resist composition, method for manufacturing electronic device, and electronic device Michihiro SHIRAKAWA, Keita Kato, Tadahiro ODANI, Atsushi Nakamura, Kaoru Iwato 2016-08-16
9383645 Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, manufacturing method of electronic device, and electronic device Shuhei Yamaguchi, Kei Yamamoto, Fumihiro YOSHINO 2016-07-05
9327611 Temperature elevating apparatus of secondary battery and vehicle equipped with same Yuji Nishi, Masatoshi Tazawa, Masanobu Matsusaka, Makoto Ishikura 2016-05-03
9323683 Storage apparatus and method for controlling internal process Toshihiko Suzuki, Emi Cho 2016-04-26
9316910 Pattern forming method, actinic-ray-sensitive or radiation-sensitive resin composition, and resist film Shohei Kataoka, Shuhei Yamaguchi, Shoichi SAITOH, Michihiro SHIRAKAWA, Fumihiro YOSHINO 2016-04-19
9312379 Manufacturing method of semiconductor apparatus and semiconductor apparatus Yasushi Niimura, Sota WATANABE, Takumi Fujimoto, Takeyoshi Nishimura, Takamasa Wakabayashi 2016-04-12
9250532 Pattern forming method, multi-layered resist pattern, multi-layered film for organic solvent development, resist composition, method for manufacturing electronic device, and electronic device Keita Kato, Michihiro SHIRAKAWA, Tadahiro ODANI, Atsushi Nakamura, Kaoru Iwato 2016-02-02
9244344 Actinic ray-sensitive or radiation-sensitive resin composition, and, resist film, pattern forming method, electronic device manufacturing method, and electronic device, each using the same Kosuke Koshijima, Shuhei Yamaguchi, Kei Yamamoto 2016-01-26
9235117 Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, manufacturing method of electronic device, and electronic device Junichi Ito, Shuhei Yamaguchi, Kei Yamamoto 2016-01-12