| 9490186 |
Limiting adjustment of polishing rates during substrate polishing |
Dominic J. Benvegnu, Benjamin Cherian, Sivakumar Dhandapani |
2016-11-08 |
| 9482610 |
Techniques for matching spectra |
Kiran Shrestha, Boguslaw A. Swedek, Jeffrey Drue David |
2016-11-01 |
| 9375824 |
Adjustment of polishing rates during substrate polishing with predictive filters |
Dominic J. Benvegnu, Benjamin Cherian, Sivakumar Dhandapani |
2016-06-28 |
| 9346146 |
Adjusting polishing rates by using spectrographic monitoring of a substrate during processing |
Jeffrey Drue David, Dominic J. Benvegnu, Boguslaw A. Swedek |
2016-05-24 |
| 9296084 |
Polishing control using weighting with default sequence |
Jimin Zhang, Zhihong Wang, Wen-Chiang Tu |
2016-03-29 |
| 9289875 |
Feed forward and feed-back techniques for in-situ process control |
Jeffrey Drue David, Jun Qian |
2016-03-22 |
| 9283653 |
Dynamically tracking spectrum features for endpoint detection |
Jeffrey Drue David |
2016-03-15 |
| 9248544 |
Endpoint detection during polishing using integrated differential intensity |
Jimin Zhang, Zhihong Wang, Wen-Chiang Tu |
2016-02-02 |
| 9227293 |
Multi-platen multi-head polishing architecture |
Jeffrey Drue David, Boguslaw A. Swedek, Doyle E. Bennett, Thomas H. Osterheld, Benjamin Cherian +3 more |
2016-01-05 |
