Issued Patents 2016
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9490186 | Limiting adjustment of polishing rates during substrate polishing | Dominic J. Benvegnu, Benjamin Cherian, Harry Q. Lee | 2016-11-08 |
| 9375824 | Adjustment of polishing rates during substrate polishing with predictive filters | Dominic J. Benvegnu, Benjamin Cherian, Harry Q. Lee | 2016-06-28 |
| 9242337 | Dynamic residue clearing control with in-situ profile control (ISPC) | Jun Qian, Benjamin Cherian, Thomas H. Osterheld, Charles C. Garretson | 2016-01-26 |