Issued Patents 2011
Showing 1–8 of 8 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8027088 | Catadioptric projection objective with tilted deflecting mirrors, projection exposure apparatus, projection exposure method, and mirror | Ralf Mueller, Aksel Goehnermeier | 2011-09-27 |
| 7982854 | Projection exposure system, method for manufacturing a micro-structured structural member by the aid of such a projection exposure system and polarization-optical element adapted for use in such a system | Hans-Juergen Mann, Toralf Gruner, Olaf Dittmann, Michael Totzeck | 2011-07-19 |
| 7977651 | Illumination system particularly for microlithography | Hans-Juergen Mann, Joerg Schultz, Johannes Wangler, Karl-Heinz Schuster, Udo Dinger +2 more | 2011-07-12 |
| 7914955 | Masks, lithography device and semiconductor component | Hans-Juergen Mann, Martin Lowisch | 2011-03-29 |
| 7911584 | Illumination system for microlithography | Joachim Wietzorrek, Joachim Hainz, Gabriele Weirauch, Manfred Maul | 2011-03-22 |
| RE42065 | Illumination system particularly for microlithography | Martin Antoni, Johannes Wangler | 2011-01-25 |
| 7871171 | Focusing-device for the radiation from a light source | Martin Antoni, Frank Melzer, Andreas Seifert | 2011-01-18 |
| 7869138 | Projection objective and projection exposure apparatus with negative back focus of the entry pupil | Hans-Juergen Mann | 2011-01-11 |