Issued Patents 2011
Showing 1–5 of 5 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8031326 | Illumination system or projection lens of a microlithographic exposure system | Susanne Beder, Wilfried Clauss, Heiko Feldmann, Daniel Kraehmer, Aurelian Dodoc | 2011-10-04 |
| 7982854 | Projection exposure system, method for manufacturing a micro-structured structural member by the aid of such a projection exposure system and polarization-optical element adapted for use in such a system | Hans-Juergen Mann, Wolfgang Singer, Toralf Gruner, Olaf Dittmann | 2011-07-19 |
| 7982969 | Projection objective of a microlithographic projection exposure apparatus | Karl-Heinz Schuster, Heiko Feldmann, Toralf Gruner, Wilfried Clauss, Susanne Beder +2 more | 2011-07-19 |
| 7961297 | Method for determining intensity distribution in the image plane of a projection exposure arrangement | Joern Greif-Wuestenbecker, Beate Boehme, Ulrich Stroessner, Vladimir Kamenov, Olaf Dittmann +3 more | 2011-06-14 |
| 7924436 | Method for approximating an influence of an optical system on the state of polarization of optical radiation | Markus Mengel | 2011-04-12 |