Issued Patents 2011
Showing 1–8 of 8 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8068276 | Projection objective for lithography | Heiko Feldmann, Susanne Beder, Alexander Epple, Hans-Juergen Rostalski | 2011-11-29 |
| 8064040 | Projection objective, projection exposure apparatus and reflective reticle for microlithography | Wilhelm Ulrich, Dieter Bader, Alexander Epple | 2011-11-22 |
| 8031326 | Illumination system or projection lens of a microlithographic exposure system | Michael Totzeck, Susanne Beder, Wilfried Clauss, Heiko Feldmann, Daniel Kraehmer | 2011-10-04 |
| 7969663 | Projection objective for immersion lithography | Wilhelm Ulrich, Hans-Juergen Rostalski | 2011-06-28 |
| 7965453 | Projection objective and projection exposure apparatus including the same | Wilhelm Ulrich, Heiko Feldmann, Hans-Juergen Rostalski | 2011-06-21 |
| 7957069 | Projection optical system | Wilhelm Ulrich | 2011-06-07 |
| 7920338 | Reduction projection objective and projection exposure apparatus including the same | Wilhelm Ulrich | 2011-04-05 |
| 7869122 | Catadioptric projection objective | David Shafer, Wilhelm Ulrich, Rudolf Von Buenau, Hans-Juergen Mann, Alexander Epple | 2011-01-11 |