Issued Patents 2011
Showing 1–10 of 10 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8064040 | Projection objective, projection exposure apparatus and reflective reticle for microlithography | Aurelian Dodoc, Dieter Bader, Alexander Epple | 2011-11-22 |
| 8054557 | Lithography projection objective, and a method for correcting image defects of the same | Ulrich Loering, Vladan Blahnik, Daniel Kraehmer, Norbert Wabra | 2011-11-08 |
| 8027022 | Projection objective | Johannes Zellner, Hans-Juergen Mann | 2011-09-27 |
| 8004755 | Catoptric objectives and systems using catoptric objectives | Hans-Juergen Mann, David Shafer | 2011-08-23 |
| 7977651 | Illumination system particularly for microlithography | Hans-Juergen Mann, Wolfgang Singer, Joerg Schultz, Johannes Wangler, Karl-Heinz Schuster +2 more | 2011-07-12 |
| 7969663 | Projection objective for immersion lithography | Aurelian Dodoc, Hans-Juergen Rostalski | 2011-06-28 |
| 7965453 | Projection objective and projection exposure apparatus including the same | Aurelian Dodoc, Heiko Feldmann, Hans-Juergen Rostalski | 2011-06-21 |
| 7957069 | Projection optical system | Aurelian Dodoc | 2011-06-07 |
| 7920338 | Reduction projection objective and projection exposure apparatus including the same | Aurelian Dodoc | 2011-04-05 |
| 7869122 | Catadioptric projection objective | David Shafer, Aurelian Dodoc, Rudolf Von Buenau, Hans-Juergen Mann, Alexander Epple | 2011-01-11 |