Issued Patents 2011
Showing 1–11 of 11 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8058219 | Metals compatible post-etch photoresist remover and/or sacrificial antireflective coating etchant | Melissa K. Rath, David Bernhard, Ping Jiang, Renjie Zhou, Michael B. Korzenski | 2011-11-15 |
| 8053375 | Super-dry reagent compositions for formation of ultra low k films | Chongying Xu, Jeffrey F. Roeder, Steven M. Bilodeau, Scott L. Battle, William Hunks +1 more | 2011-11-08 |
| 8034407 | Chemical vapor deposition of high conductivity, adherent thin films of ruthenium | Bryan C. Hendrix, James Welch, Steven M. Bilodeau, Jeffrey F. Roeder, Chongying Xu | 2011-10-11 |
| 8008117 | Antimony and germanium complexes useful for CVD/ALD of metal thin films | William Hunks, Tianniu Chen, Chongying Xu, Jeffrey F. Roeder, Melissa A. Petruska +4 more | 2011-08-30 |
| 7994108 | Composition useful for removal of post-etch photoresist and bottom anti-reflection coatings | David W. Minsek, Weihua Wang, David Bernhard, Melissa K. Rath | 2011-08-09 |
| 7964746 | Copper precursors for CVD/ALD/digital CVD of copper metal films | Tianniu Chen, Chongying Xu, Bryan C. Hendrix, Jeffrey F. Roeder, Juan E. Dominguez +2 more | 2011-06-21 |
| 7931713 | Chemical mechanical planarization pad | — | 2011-04-26 |
| 7910765 | Composition and method for low temperature deposition of silicon-containing films such as films including silicon, silicon nitride, silicon dioxide and/or silicon-oxynitride | Ziyun Wang, Chongying Xu, Ravi Laxman, Bryan C. Hendrix, Jeffrey F. Roeder | 2011-03-22 |
| 7887883 | Composition and method for low temperature deposition of silicon-containing films | Ziyun Wang, Chongying Xu, Bryan C. Hendrix, Jeffrey F. Roeder | 2011-02-15 |
| 7862857 | Scalable lead zirconium titanate (PZT) thin film material and deposition method, and ferroelectric memory device structures comprising such thin film material | Peter C. Van Buskirk, Jeffrey F. Roeder, Steven M. Bilodeau, Michael W. Russell, Stephen T. Johnston +1 more | 2011-01-04 |
| 7863203 | Monosilane or disilane derivatives and method for low temperature deposition of silicon-containing films using the same | Ziyun Wang, Chongying Xu | 2011-01-04 |