Issued Patents 2011
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7994108 | Composition useful for removal of post-etch photoresist and bottom anti-reflection coatings | Weihua Wang, David Bernhard, Thomas H. Baum, Melissa K. Rath | 2011-08-09 |
| 7922824 | Oxidizing aqueous cleaner for the removal of post-etch residues | Michael B. Korzenski, Martha M. Rajaratnam | 2011-04-12 |