Issued Patents 2011
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8058219 | Metals compatible post-etch photoresist remover and/or sacrificial antireflective coating etchant | Melissa K. Rath, Thomas H. Baum, Ping Jiang, Renjie Zhou, Michael B. Korzenski | 2011-11-15 |
| 7994108 | Composition useful for removal of post-etch photoresist and bottom anti-reflection coatings | David W. Minsek, Weihua Wang, Thomas H. Baum, Melissa K. Rath | 2011-08-09 |
| 7888301 | Resist, barc and gap fill material stripping chemical and method | Yoichiro Fujita, Tomoe Miyazawa, Makoto Nakajima | 2011-02-15 |