Issued Patents 2011
Showing 1–5 of 5 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8034407 | Chemical vapor deposition of high conductivity, adherent thin films of ruthenium | James Welch, Steven M. Bilodeau, Jeffrey F. Roeder, Chongying Xu, Thomas H. Baum | 2011-10-11 |
| 8008117 | Antimony and germanium complexes useful for CVD/ALD of metal thin films | William Hunks, Tianniu Chen, Chongying Xu, Jeffrey F. Roeder, Thomas H. Baum +4 more | 2011-08-30 |
| 7964746 | Copper precursors for CVD/ALD/digital CVD of copper metal films | Tianniu Chen, Chongying Xu, Thomas H. Baum, Jeffrey F. Roeder, Juan E. Dominguez +2 more | 2011-06-21 |
| 7910765 | Composition and method for low temperature deposition of silicon-containing films such as films including silicon, silicon nitride, silicon dioxide and/or silicon-oxynitride | Ziyun Wang, Chongying Xu, Ravi Laxman, Thomas H. Baum, Jeffrey F. Roeder | 2011-03-22 |
| 7887883 | Composition and method for low temperature deposition of silicon-containing films | Ziyun Wang, Chongying Xu, Thomas H. Baum, Jeffrey F. Roeder | 2011-02-15 |