MA

Marie Angelopoulos

IBM: 10 patents #58 of 5,464Top 2%
📍 Dover, NJ: #1 of 63 inventorsTop 2%
🗺 New Jersey: #21 of 5,136 inventorsTop 1%
Overall (2004): #1,536 of 270,089Top 1%
10
Patents 2004

Issued Patents 2004

Showing 1–10 of 10 patents

Patent #TitleCo-InventorsDate
6830708 Water-soluble electrically conducting polymers, their synthesis and use Jeffrey D. Gelorme, Thomas H. Newman, Niranjan M. Patel, David E. Seeger 2004-12-14
6821718 Radiation sensitive silicon-containing negative resists and use thereof Ari Aviram, Wu-Song Huang, Ranee W. Kwong, Robert N. Lang, Qinghuang Lin +1 more 2004-11-23
6806349 Methods of fabrication of deaggregated electrically conductive polymers and precursors thereof Bruce K. Furman 2004-10-19
6752935 Deaggregated electrically conductive polymers and precursors thereof Bruce K. Furman 2004-06-22
6746770 Electrically conductive and abrasion/scratch resistant polymeric materials, method of fabrication thereof and uses thereof Ali Afzali-Ardakani, Jack A. Dickerson, Thomas Baird Pillsbury, Karl J. Puttlitz, Jane M. Shaw +1 more 2004-06-08
6730454 Antireflective SiO-containing compositions for hardmask layer Dirk Pfeiffer, Katherina Babich, Phillip Brock, Wu-Song Huang, Arpan Mahorowala +2 more 2004-05-04
6730445 Attenuated embedded phase shift photomask blanks Katherina Babich, S. Jay Chey, Michael S. Hibbs, Robert N. Lang, Arpan Mahorowala +1 more 2004-05-04
6686124 Multifunctional polymeric materials and use thereof Katherina Babich, David R. Medeiros, Wayne M. Moreau 2004-02-03
6685853 Energy sensitive electrically conductive admixtures, uses thereof, methods of fabrication and structures fabricated therewith Edward D. Babich, Inna V. Babich, Kuang-Jung Chen, Wayne M. Moreau, David E. Seeger 2004-02-03
6682860 Attenuated embedded phase shift photomask blanks Katherina Babich, S. Jay Chey, Michael S. Hibbs, Robert N. Lang, Arpan Mahorowala +1 more 2004-01-27