Issued Patents 2004
Showing 1–11 of 11 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6824658 | Partial turn coil for generating a plasma | Bradley O. Stimson | 2004-11-30 |
| 6790326 | Magnetron for a vault shaped sputtering target having two opposed sidewall magnets | Anantha K. Subramani, Umesh M. Kelkar, Jianming Fu | 2004-09-14 |
| 6790323 | Self ionized sputtering using a high density plasma source | Jianming Fu, Fusen Chen, John E. Foster | 2004-09-14 |
| 6787006 | Operating a magnetron sputter reactor in two modes | Jianming Fu, Fusen Chen, Girish Dixit, Zheng Xu, Wei Wang +1 more | 2004-09-07 |
| 6783639 | Coils for generating a plasma and for sputtering | Jaim Nulman, Sergio Edelstein, Mani Subramani, Zheng Xu, Howard Grunes +2 more | 2004-08-31 |
| 6784096 | Methods and apparatus for forming barrier layers in high aspect ratio vias | Fusen Chen, Ling Chen, Walter Glenn, Jianming Fu | 2004-08-31 |
| 6758949 | Magnetically confined metal plasma sputter source with magnetic control of ion and neutral densities | Wei Wang, Jianming Fu | 2004-07-06 |
| 6730196 | Auxiliary electromagnets in a magnetron sputter reactor | Wei Wang, Jianming Fu | 2004-05-04 |
| 6723214 | Apparatus for improved power coupling through a workpiece in a semiconductor wafer processing system | Bradley O. Stimson, Mitsuhiro Kaburaki, John C. Forster, Eric Delaurentis, Patricia Rodriguez +1 more | 2004-04-20 |
| 6709553 | Multiple-step sputter deposition | Wei Wang, Jianming Fu | 2004-03-23 |
| 6673724 | Pulsed-mode RF bias for side-wall coverage improvement | John C. Forster, Bradley O. Stimson, Liubo Hong | 2004-01-06 |