Issued Patents 2004
Showing 1–9 of 9 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6790326 | Magnetron for a vault shaped sputtering target having two opposed sidewall magnets | Anantha K. Subramani, Umesh M. Kelkar, Praburam Gopalraja | 2004-09-14 |
| 6790323 | Self ionized sputtering using a high density plasma source | Praburam Gopalraja, Fusen Chen, John E. Foster | 2004-09-14 |
| 6787006 | Operating a magnetron sputter reactor in two modes | Praburam Gopalraja, Fusen Chen, Girish Dixit, Zheng Xu, Wei Wang +1 more | 2004-09-07 |
| 6784096 | Methods and apparatus for forming barrier layers in high aspect ratio vias | Fusen Chen, Ling Chen, Walter Glenn, Praburam Gopalraja | 2004-08-31 |
| 6758949 | Magnetically confined metal plasma sputter source with magnetic control of ion and neutral densities | Wei Wang, Praburam Gopalraja | 2004-07-06 |
| 6743340 | Sputtering of aligned magnetic materials and magnetic dipole ring used therefor | — | 2004-06-01 |
| 6730196 | Auxiliary electromagnets in a magnetron sputter reactor | Wei Wang, Praburam Gopalraja | 2004-05-04 |
| 6709553 | Multiple-step sputter deposition | Wei Wang, Praburam Gopalraja | 2004-03-23 |
| 6692617 | Sustained self-sputtering reactor having an increased density plasma | Peijun Ding, Zheng Xu | 2004-02-17 |