Issued Patents 2002
Showing 26–50 of 61 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6432813 | Semiconductor processing method of forming insulative material over conductive lines | Ravi Iyer | 2002-08-13 |
| 6429071 | Method of increasing capacitance of memory cells incorporating hemispherical grained silicon | Sujit Sharan, Thomas A. Figura, Anand Srinivasan | 2002-08-06 |
| 6428623 | Chemical vapor deposition apparatus with liquid feed | Donald L. Westmoreland | 2002-08-06 |
| 6423626 | Removal of metal cusp for improved contact fill | Anand Srinivasan, Sujit Sharan | 2002-07-23 |
| 6423582 | Use of DAR coating to modulate the efficiency of laser fuse blows | Mark Fischer, Zhiping Yin, Thomas R. Glass, Kunal R. Parekh | 2002-07-23 |
| 6420230 | Capacitor fabrication methods and capacitor constructions | Garo Derderian | 2002-07-16 |
| 6417085 | Methods of forming a field effect transistor gate construction | Shubneesh Batra | 2002-07-09 |
| 6410453 | Method of processing a substrate | — | 2002-06-25 |
| 6406998 | Formation of silicided contact by ion implantation | Kirk D. Prall | 2002-06-18 |
| 6399982 | Rough (high surface area) electrode from Ti and TiN capacitors and semiconductor devices including same | Garo Derderian | 2002-06-04 |
| 6395128 | RF powered plasma enhanced chemical vapor deposition reactor and methods of effecting plasma enhanced chemical vapor deposition | Sujit Sharan, Paul Smith, Mei Chang | 2002-05-28 |
| 6395614 | Methods of forming materials comprising tungsten and nitrogen, and methods of forming capacitors | Vishnu K. Agarwal | 2002-05-28 |
| 6395602 | Method of forming a capacitor | Pierre C. Fazan | 2002-05-28 |
| 6392913 | Method of forming a polysilicon diode and devices incorporating such diode | — | 2002-05-21 |
| 6388284 | Capacitor structures | Howard E. Rhodes, Lyle Breiner, Philip J. Ireland, Trung T. Doan, Sujit Sharan | 2002-05-14 |
| 6380611 | Treatment for film surface to reduce photo footing | Zhiping Yin | 2002-04-30 |
| 6380599 | Method and apparatus for trench isolation process with pad gate and trench edge spacer elimination | Pierre C. Fazan | 2002-04-30 |
| 6376781 | Low resistance contacts fabricated in high aspect ratio openings by resputtering | — | 2002-04-23 |
| 6376327 | Structures formed using excess oxygen containing material | Garo Derderian | 2002-04-23 |
| 6372669 | Method of depositing silicon oxides | Ravi Iyer | 2002-04-16 |
| 6372643 | Method for forming a selective contact and local interconnect in situ and semiconductor devices carrying the same | Christopher W. Hill, Weimin Li | 2002-04-16 |
| 6368986 | Use of selective ozone TEOS oxide to create variable thickness layers and spacers | William Budge, Christopher W. Hill | 2002-04-09 |
| 6368988 | Combined gate cap or digit line and spacer deposition using HDP | Weimin Li, Sujit Sharan | 2002-04-09 |
| 6365486 | Method of fabricating semiconductor devices utilizing in situ passivation of dielectric thin films | Vishnu K. Agarwal, Garo Derderian | 2002-04-02 |
| 6362114 | Semiconductor processing methods of forming an oxynitride film on a silicon substrate | Pierre C. Fazan | 2002-03-26 |