Issued Patents 2002
Showing 1–4 of 4 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6420101 | Method of reducing post-development defects in and around openings formed in photoresist by use of non-patterned exposure | Zhijian Lu, Alan C. Thomas, Alois Gutmann, Margaret C. Lawson | 2002-07-16 |
| 6372408 | Method of reducing post-development defects in and around openings formed in photoresist by use of multiple development/rinse cycles | Zhijian Lu, Alan C. Thomas, Alois Gutmann, Margaret C. Lawson | 2002-04-16 |
| 6365321 | Blends of hydroxystyrene polymers for use in chemically amplified positive resist formulations | Ronald A. DellaGuardia, Hiroshi Ito, George M. Jordhamo, Ahmad D. Katnani | 2002-04-02 |
| 6338934 | Hybrid resist based on photo acid/photo base blending | Mark C. Hakey, Steven J. Holmes, Wu-Song Huang, Paul A. Rabidoux | 2002-01-15 |