Issued Patents 2002
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6420101 | Method of reducing post-development defects in and around openings formed in photoresist by use of non-patterned exposure | Zhijian Lu, Alan C. Thomas, Alois Gutmann, Kuang-Jung Chen | 2002-07-16 |
| 6372408 | Method of reducing post-development defects in and around openings formed in photoresist by use of multiple development/rinse cycles | Zhijian Lu, Alan C. Thomas, Alois Gutmann, Kuang-Jung Chen | 2002-04-16 |