Issued Patents 2002
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6420101 | Method of reducing post-development defects in and around openings formed in photoresist by use of non-patterned exposure | Zhijian Lu, Alan C. Thomas, Kuang-Jung Chen, Margaret C. Lawson | 2002-07-16 |
| 6379869 | Method of improving the etch resistance of chemically amplified photoresists by introducing silicon after patterning | Uwe Schroeder, Gerhard Kunkel, Bruno Spuler | 2002-04-30 |
| 6372408 | Method of reducing post-development defects in and around openings formed in photoresist by use of multiple development/rinse cycles | Zhijian Lu, Alan C. Thomas, Kuang-Jung Chen, Margaret C. Lawson | 2002-04-16 |