Issued Patents 2002
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6420101 | Method of reducing post-development defects in and around openings formed in photoresist by use of non-patterned exposure | Alan C. Thomas, Alois Gutmann, Kuang-Jung Chen, Margaret C. Lawson | 2002-07-16 |
| 6383715 | Strongly water-soluble photoacid generator resist compositions | Alois Gutman | 2002-05-07 |
| 6372408 | Method of reducing post-development defects in and around openings formed in photoresist by use of multiple development/rinse cycles | Alan C. Thomas, Alois Gutmann, Kuang-Jung Chen, Margaret C. Lawson | 2002-04-16 |