Issued Patents 2002
Showing 1–6 of 6 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6440635 | Low “K” factor hybrid photoresist | Steven J. Holmes, Niranjan M. Patel, Paul A. Rabidoux | 2002-08-27 |
| 6372406 | Deactivated aromatic amines as additives in acid-catalyzed resists | William R. Brunsvold, Pushkara R. Varanasi | 2002-04-16 |
| 6372412 | Method of producing an integrated circuit chip using frequency doubling hybrid photoresist and apparatus formed thereby | Mark C. Hakey, Steven J. Holmes, David V. Horak, Niranjan M. Patel, Paul A. Rabidoux | 2002-04-16 |
| 6365321 | Blends of hydroxystyrene polymers for use in chemically amplified positive resist formulations | Kuang-Jung Chen, Ronald A. DellaGuardia, Hiroshi Ito, George M. Jordhamo | 2002-04-02 |
| 6344305 | Radiation sensitive silicon-containing resists | Qinghuang Lin, Douglas Charles LaTulipe, David E. Seeger, William R. Brunsvold, Ali Afzali-Ardakani | 2002-02-05 |
| 6340734 | Silsesquioxane polymers, method of synthesis, photoresist composition, and multilayer lithographic method | Qinghuang Lin, Marie Angelopoulos, Ratnam Sooriyakumaran | 2002-01-22 |