Issued Patents 2002
Showing 1–4 of 4 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6420084 | Mask-making using resist having SIO bond-containing polymer | Marie Angelopoulos, Ari Aviram, C. Richard Guarnieri, Ranee W. Kwong, Robert N. Lang +3 more | 2002-07-16 |
| 6420088 | Antireflective silicon-containing compositions as hardmask layer | Marie Angelopoulos, Ari Aviram, C. Richard Guarnieri, Ranee W. Kwong, Wayne M. Moreau | 2002-07-16 |
| 6346362 | Polymers and use thereof | Ari Aviram, C. Richard Guarnieri, Ranee W. Kwong, David R. Medeiros | 2002-02-12 |
| 6338934 | Hybrid resist based on photo acid/photo base blending | Kuang-Jung Chen, Mark C. Hakey, Steven J. Holmes, Paul A. Rabidoux | 2002-01-15 |