Issued Patents 2002
Showing 1–11 of 11 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6497802 | Self ionized plasma sputtering | — | 2002-12-24 |
| 6485618 | Integrated copper fill process | Praburam Gopalraja, Fusen Chen, Girish Dixit, Zheng Xu, Sankaram Athreya +2 more | 2002-11-26 |
| 6485617 | Sputtering method utilizing an extended plasma region | Praburam Gopalraja | 2002-11-26 |
| 6451177 | Vault shaped target and magnetron operable in two sputtering modes | Praburam Gopalraja, Fusen Chen, Girish Dixit, Zheng Xu, Wei Wang +1 more | 2002-09-17 |
| 6444104 | Sputtering target having an annular vault | Praburam Gopalraja | 2002-09-03 |
| 6436251 | Vault-shaped target and magnetron having both distributed and localized magnets | Praburam Gopalraja, Wei Wang | 2002-08-20 |
| 6413383 | Method for igniting a plasma in a sputter reactor | Tony P. Chiang, Yu D. Cong, Peijun Ding, Howard H. Tang, Anish Tolia | 2002-07-02 |
| 6413382 | Pulsed sputtering with a small rotating magnetron | Wei Wang, Praburam Gopalraja, Zheng Xu | 2002-07-02 |
| 6406599 | Magnetron with a rotating center magnet for a vault shaped sputtering target | Anantha K. Subramani, Umesh M. Kelkar, Praburam Gopalraja | 2002-06-18 |
| 6398929 | Plasma reactor and shields generating self-ionized plasma for sputtering | Tony P. Chiang, Yu D. Cong, Peijun Ding, Howard H. Tang, Anish Tolia | 2002-06-04 |
| 6358376 | Biased shield in a magnetron sputter reactor | Wei Wang, Praburam Gopalraja | 2002-03-19 |