Issued Patents 2002
Showing 1–21 of 21 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6470230 | Supervisory method for determining optimal process targets based on product performance in microelectronic fabrication | Michael L. Miller, Thomas J. Sonderman | 2002-10-22 |
| 6460002 | Method and apparatus for data stackification for run-to-run control | Christopher A. Bone | 2002-10-01 |
| 6442496 | Method and apparatus for dynamic sampling of a production line | Alexander J. Pasadyn | 2002-08-27 |
| 6440622 | Method for controlling and monitoring light source intensity | Richard D. Edwards, Curtis Warren Doss | 2002-08-27 |
| 6427093 | Method and apparatus for optimal wafer-by-wafer processing | — | 2002-07-30 |
| 6419846 | Determining endpoint in etching processes using principal components analysis of optical emission spectra | Joseph William Wiseman, Hongyu Yue | 2002-07-16 |
| 6417912 | Method and apparatus for controlling optical-parameters in a stepper | Scott Bushman, Richard D. Edwards, Edward C. Stewart | 2002-07-09 |
| 6410351 | Method and apparatus for modeling thickness profiles and controlling subsequent etch process | Christopher A. Bode | 2002-06-25 |
| 6409879 | System for controlling transistor spacer width | John R. Behnke, Matthew A. Purdy | 2002-06-25 |
| 6405096 | Method and apparatus for run-to-run controlling of overlay registration | Christopher A. Bode, Richard D. Edwards | 2002-06-11 |
| 6405144 | Method and apparatus for programmed latency for improving wafer-to-wafer uniformity | Paul Ackmann, Stuart E. Brown | 2002-06-11 |
| 6387823 | Method and apparatus for controlling deposition process using residual gas analysis | Thomas J. Sonderman | 2002-05-14 |
| 6379980 | Method and apparatus for monitoring material removal tool performance using endpoint time removal rate determination | — | 2002-04-30 |
| 6368883 | Method for identifying and controlling impact of ambient conditions on photolithography processes | Christopher A. Bode | 2002-04-09 |
| 6368879 | Process control with control signal derived from metrology of a repetitive critical dimension feature of a test structure on the work piece | — | 2002-04-09 |
| 6365422 | Automated variation of stepper exposure dose based upon across wafer variations in device characteristics, and system for accomplishing same | Joyce S. Oey Hewett | 2002-04-02 |
| 6360133 | Method and apparatus for automatic routing for reentrant process | William J. Campbell, Christopher A. Bone | 2002-03-19 |
| 6355388 | Method for controlling photoresist strip processes | — | 2002-03-12 |
| 6352867 | Method of controlling feature dimensions based upon etch chemistry concentrations | Terri A. Couteau, William J. Campbell | 2002-03-05 |
| 6348289 | System and method for controlling polysilicon feature critical dimension during processing | Terri A. Couteau, W. Jarrett Campbell | 2002-02-19 |
| 6346426 | Method and apparatus for characterizing semiconductor device performance variations based on independent critical dimension measurements | Derick J. Wristers, Jon D. Cheek | 2002-02-12 |