Issued Patents 2002
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6410351 | Method and apparatus for modeling thickness profiles and controlling subsequent etch process | Anthony J. Toprac | 2002-06-25 |
| 6405096 | Method and apparatus for run-to-run controlling of overlay registration | Anthony J. Toprac, Richard D. Edwards | 2002-06-11 |
| 6368883 | Method for identifying and controlling impact of ambient conditions on photolithography processes | Anthony J. Toprac | 2002-04-09 |