Issued Patents 2002
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6410191 | Phase-shift photomask for patterning high density features | John L. Nistler | 2002-06-25 |
| 6405144 | Method and apparatus for programmed latency for improving wafer-to-wafer uniformity | Anthony J. Toprac, Paul Ackmann | 2002-06-11 |