Issued Patents All Time
Showing 25 most recent of 184 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8062536 | High density plasma chemical vapor deposition process | Chih-Chien Liu, Ta-Shan Tseng, Wen-Bin Shieh, Juan-Yuan Wu, Shih-Wei Sun | 2011-11-22 |
| 7718079 | High density plasma chemical vapor deposition process | Chih-Chien Liu, Ta-Shan Tseng, Wen-Bin Shieh, Juan-Yuan Wu, Shih-Wei Sun | 2010-05-18 |
| 7514014 | High density plasma chemical vapor deposition process | Chih-Chien Liu, Ta-Shan Tseng, W.B. Shieh, J. Y. Wu, Shih-Wei Sun | 2009-04-07 |
| 7449407 | Air gap for dual damascene applications | David Lee, Kuang-Chih Wang, Ming-Sheng Yang | 2008-11-11 |
| 7378740 | Dual damascene structure for the wiring-line structures of multi-level interconnects in integrated circuit | Tri-Rung Yew, Yimin Huang, Shih-Wei Sun | 2008-05-27 |
| 7271101 | High density plasma chemical vapor deposition process | Chih-Chien Liu, Ta-Shan Tseng, Wen-Bin Shieh, Juan-Yuan Wu, Shih-Wei Sun | 2007-09-18 |
| 7253095 | Air gap formation method for reducing undesired capacitive coupling between interconnects in an integrated circuit device | David Lee, Kuang-Chih Wang, Ming-Sheng Yang | 2007-08-07 |
| 7138329 | Air gap for tungsten/aluminum plug applications | David Lee, Kuang-Chih Wang, Ming-Sheng Yang | 2006-11-21 |
| 7105426 | Method of forming a semi-insulating region | Joey Lai | 2006-09-12 |
| 7078346 | High density plasma chemical vapor deposition process | Chih-Chien Liu, Ta-Shan Tseng, Wen-Bin Shieh, Juan-Yuan Wu, Shih-Wei Sun | 2006-07-18 |
| 7064048 | Method of forming a semi-insulating region | Joey Lai | 2006-06-20 |
| 7037802 | Chemical mechanical polishing in forming semiconductor device | Ming-Sheng Yang, Juan-Yuan Wu | 2006-05-02 |
| 7018906 | Chemical mechanical polishing for forming a shallow trench isolation structure | Coming Chen, Juan-Yuan Wu | 2006-03-28 |
| 7005363 | Method of forming a semi-insulating region | Joey Lai | 2006-02-28 |
| 7001713 | Method of forming partial reverse active mask | Coming Chen, Juan-Yuan Wu | 2006-02-21 |
| 6943110 | Wafer processing apparatus and methods for depositing cobalt silicide | David Lee, Kuang-Chih Wang | 2005-09-13 |
| 6917109 | Air gap structure and formation method for reducing undesired capacitive coupling between interconnects in an integrated circuit device | David Lee, Kuang-Chih Wang, Ming-Sheng Yang | 2005-07-12 |
| 6878627 | Semiconductor device with cobalt silicide contacts and method of making the same | David Lee, Kuang-Chih Wang | 2005-04-12 |
| 6858487 | Method of manufacturing a semiconductor device | Ming-Sheng Yang | 2005-02-22 |
| 6838357 | Chemical mechanical polishing for forming a shallow trench isolation structure | Coming Chen, Juan-Yuan Wu | 2005-01-04 |
| 6810511 | Method of designing active region pattern with shift dummy pattern | Coming Chen, Juan-Yuan Wu | 2004-10-26 |
| 6809022 | Method for forming dielectric layers | Chih-Chien Liu, Juan-Yuan Wu | 2004-10-26 |
| 6790742 | Chemical mechanical polishing in forming semiconductor device | Ming-Sheng Yang, Juan-Yuan Wu | 2004-09-14 |
| 6743721 | Method and system for making cobalt silicide | David Lee, Kuang-Chih Wang | 2004-06-01 |
| 6627387 | Method of photolithography | Kevin Hsieh, Chih-Yung Lin, Chih-Hsiang Hsiao, Juan-Yuan Wu | 2003-09-30 |