Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › High density plasma chemical vapor deposition process

High density plasma chemical vapor deposition process

US Patent 7078346 · Granted Jul 18, 2006

Estimated economic value: $3,143,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Layout structure forming method of sense amplifier and layout structure of sense2025
Photoresist and method2025
In-situ deposition and densification treatment for metal-comprising resist layer2025
Photoresist layer surface treatment, cap layer, and method of forming photoresis2025
Regenerable nanoparticle for removing manganese and preparatory and use methods2025
Semiconductor device and method for fabricating the same2023
Composite membrane comprising a decellularized amniotic membrane and a method fo2023
Portable electronic device and disinfecting and sterilizing method thereof2022
Semiconductor device and method for fabricating the same2022
Communication apparatus, electronic apparatus and antenna adjustment method2021
Semiconductor device and method for fabricating the same2020
Method of forming a stop layer filling in a space between spacers2020