Issued Patents All Time
Showing 1–25 of 64 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12275656 | Regenerable nanoparticle for removing manganese and preparatory and use methods | Guobin LIANG, Wei Lin, Xiafei YIN, Manying Zhang, Quanfa ZHOU | 2025-04-15 |
| 11628238 | Composite membrane comprising a decellularized amniotic membrane and a method for preparing the same | Huanhuan Liu, Brian GINN, Haiquan Mao | 2023-04-18 |
| 8062536 | High density plasma chemical vapor deposition process | Chih-Chien Liu, Ta-Shan Tseng, Wen-Bin Shieh, Water Lur, Shih-Wei Sun | 2011-11-22 |
| 7718079 | High density plasma chemical vapor deposition process | Chih-Chien Liu, Ta-Shan Tseng, Wen-Bin Shieh, Water Lur, Shih-Wei Sun | 2010-05-18 |
| 7271101 | High density plasma chemical vapor deposition process | Chih-Chien Liu, Ta-Shan Tseng, Wen-Bin Shieh, Water Lur, Shih-Wei Sun | 2007-09-18 |
| 7078346 | High density plasma chemical vapor deposition process | Chih-Chien Liu, Ta-Shan Tseng, Wen-Bin Shieh, Water Lur, Shih-Wei Sun | 2006-07-18 |
| 7037802 | Chemical mechanical polishing in forming semiconductor device | Ming-Sheng Yang, Water Lur | 2006-05-02 |
| 7018906 | Chemical mechanical polishing for forming a shallow trench isolation structure | Coming Chen, Water Lur | 2006-03-28 |
| 7001713 | Method of forming partial reverse active mask | Coming Chen, Water Lur | 2006-02-21 |
| 6838357 | Chemical mechanical polishing for forming a shallow trench isolation structure | Coming Chen, Water Lur | 2005-01-04 |
| 6810511 | Method of designing active region pattern with shift dummy pattern | Coming Chen, Water Lur | 2004-10-26 |
| 6809022 | Method for forming dielectric layers | Chih-Chien Liu, Water Lur | 2004-10-26 |
| 6790742 | Chemical mechanical polishing in forming semiconductor device | Ming-Sheng Yang, Water Lur | 2004-09-14 |
| 6627387 | Method of photolithography | Kevin Hsieh, Chih-Yung Lin, Chih-Hsiang Hsiao, Water Lur | 2003-09-30 |
| 6609954 | Method of planarization | Ming-Sheng Yang, Kuen-Jian Chen, Water Lur | 2003-08-26 |
| 6580508 | Method for monitoring a semiconductor wafer in a chemical mechanical polishing process | Hsueh-Chung Chen, Chien-Hung Chen | 2003-06-17 |
| 6562731 | Method for forming dielectric layers | Chih-Chien Liu, Water Lur | 2003-05-13 |
| 6486040 | Chemical mechanical polishing for forming a shallow trench isolation structure | Coming Chen, Water Lur | 2002-11-26 |
| 6448159 | Chemical mechanical polishing for forming a shallow trench isolation structure | Coming Chen, Water Lur | 2002-09-10 |
| 6362101 | Chemical mechanical polishing methods using low pH slurry mixtures | Ming-Sheng Yang, Water Lur, Shih-Wei Sun | 2002-03-26 |
| 6344408 | Method for improving non-uniformity of chemical mechanical polishing by over coating | Hsueh-Chung Chen, Ming-Sheng Yang, Water Lur | 2002-02-05 |
| 6337279 | Method of fabricating a shallow trench isolation | Chao Yuan Huang, Water Lur | 2002-01-08 |
| 6319814 | Method of fabricating dual damascene | Cheng-Yuan Tsai, Chih-Chien Liu | 2001-11-20 |
| 6319861 | Method of improving deposition | Hsueh-Hao Shih, Alan Cheng | 2001-11-20 |
| 6313028 | Method of fabricating dual damascene structure | Chao Yuan Huang, Water Lur | 2001-11-06 |