Issued Patents All Time
Showing 51–64 of 64 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6117345 | High density plasma chemical vapor deposition process | Chih-Chien Liu, Ta-Shan Tseng, Wen-Bin Shieh, Water Lur, Shih-Wei Sun | 2000-09-12 |
| 6099705 | Physical vapor deposition device for forming a uniform metal layer on a semiconductor wafer | Hsueh-Chung Chen, Water Lur | 2000-08-08 |
| 6097093 | Structure of a dual damascene | Water Lur | 2000-08-01 |
| 6093089 | Apparatus for controlling uniformity of polished material | Hsueh-Chung Chen, Water Lur | 2000-07-25 |
| 6077147 | Chemical-mechanical polishing station with end-point monitoring device | Ming-Sheng Yang, Hsueh-Chung Chen, Tsang-Jung Lin | 2000-06-20 |
| 6062964 | Chemical mechanical polishing apparatus for controlling slurry distribution | Hsueh-Chung Chen, Ming-Sheng Yang | 2000-05-16 |
| 6048771 | Shallow trench isolation technique | Tony Lin, Wen-Kuan Yeh | 2000-04-11 |
| 6036356 | In-situ slurry mixing apparatus | Ming-Sheng Yang, Chien-Hsin Lai, Chia-Jui Chang | 2000-03-14 |
| 6024106 | Post-CMP wafer clean process | Ming-Sheng Yang, Water Lur | 2000-02-15 |
| 6015755 | Method of fabricating a trench isolation structure using a reverse mask | Coming Chen, Water Lur | 2000-01-18 |
| 6001694 | Manufacturing method for integrated circuit dielectric layer | Hsueh-Hao Shih, Water Lur | 1999-12-14 |
| 5993647 | Circulation system of slurry | Chao Yuan Huang, Peng-Yih Peng | 1999-11-30 |
| 5958795 | Chemical-mechanical polishing for shallow trench isolation | Coming Chen, Water Lur | 1999-09-28 |
| 5959311 | Structure of an antenna effect monitor | Hsueh-Hao Shih, Mu-Chun Wang, Water Lur | 1999-09-28 |