MY

Ming-Sheng Yang

UM United Microelectronics: 45 patents #69 of 4,560Top 2%
NA Nec Laboratories America: 10 patents #49 of 412Top 15%
IC Ipenval Consultant: 4 patents #1 of 8Top 15%
PG Personal Genomics: 2 patents #4 of 25Top 20%
NU National Chi Nan University: 2 patents #18 of 106Top 20%
Huawei: 1 patents #8,196 of 15,535Top 55%
LT Lite-On Technology: 1 patents #549 of 1,203Top 50%
VL Visera Technologies Company Limited: 1 patents #93 of 156Top 60%
VT Voltafield Technology: 1 patents #8 of 12Top 70%
CH Chimei: 1 patents #48 of 103Top 50%
📍 Tainan, CA: #7 of 115 inventorsTop 7%
Overall (All Time): #31,020 of 4,157,543Top 1%
68
Patents All Time

Issued Patents All Time

Showing 51–68 of 68 patents

Patent #TitleCo-InventorsDate
6365228 Process for spin-on coating with an organic material having a low dielectric constant Cheng-Yuan Tsai, Chin-Hsiang Lin 2002-04-02
6362101 Chemical mechanical polishing methods using low pH slurry mixtures Juan-Yuan Wu, Water Lur, Shih-Wei Sun 2002-03-26
6344408 Method for improving non-uniformity of chemical mechanical polishing by over coating Hsueh-Chung Chen, Juan-Yuan Wu, Water Lur 2002-02-05
6323123 Low-K dual damascene integration process Chih-Chien Liu, Cheng-Yuan Tsai, Anseime Chen 2001-11-27
6306757 Method for forming a multilevel interconnect Keh-Ching Huang, Tong-Yu Chen, Tzu-Guey Jung 2001-10-23
6280079 Method of mixing slurries Peng-Yih Peng, Chia-Jui Chang, Juan-Yuan Wu 2001-08-28
6214745 Method of improving surface planarity of chemical-mechanical polishing operation by forming shallow dummy pattern Yimin Huang, Juan-Yuan Wu, Water Lur 2001-04-10
6210256 Continuous pad feeding method for chemical-mechanical polishing Hsueh-Chung Chen, Wen-Cheng Yeh 2001-04-03
6200653 Method of forming an intermetal dielectric layer Cheng-Yuan Tsai, Chih-Chien Liu 2001-03-13
6197681 Forming copper interconnects in dielectric materials with low constant dielectrics Chih-Chien Liu, Cheng-Yuan Tsai 2001-03-06
6169028 Method fabricating metal interconnected structure Kun-Chih Wang, Wen-Yi Hsieh 2001-01-02
6155912 Cleaning solution for cleaning a polishing pad used in a chemical-mechanical polishing process Hsueh-Chung Chen, Juan-Yuan Wu 2000-12-05
6077147 Chemical-mechanical polishing station with end-point monitoring device Hsueh-Chung Chen, Tsang-Jung Lin, Juan-Yuan Wu 2000-06-20
6062964 Chemical mechanical polishing apparatus for controlling slurry distribution Hsueh-Chung Chen, Juan-Yuan Wu 2000-05-16
6036356 In-situ slurry mixing apparatus Chien-Hsin Lai, Chia-Jui Chang, Juan-Yuan Wu 2000-03-14
6024106 Post-CMP wafer clean process Juan-Yuan Wu, Water Lur 2000-02-15
6001733 Method of forming a dual damascene with dummy metal lines Yimin Huang, Tri-Rung Yew 1999-12-14
5487485 Liner for a cargo container Yu-Show Cherng, CHIEN-TE LU 1996-01-30